Used LAM RESEARCH TCP 9600 #293815236 for sale

LAM RESEARCH TCP 9600
ID: 293815236
Etcher.
LAM RESEARCH TCP 9600 is an advanced etcher, or asher, designed for advanced etching, stripping and deposition of photoresist, dielectrics, polyimide and other etchable materials in the semiconductor industry. It is suitable for both high- and low-volume batch processes as well as for process development and low-cost prototyping. LAM RESEARCH TCP9600 offers a variety of process capabilities for its applications such as high-quality pattern etching, high-rate etching, uniform deposition, and reactive ion etching (RIE) capabilities. In operation, TCP-9600 etcher is configured with two independent plasma source chambers and two separate end-point control systems. The plasma sources are connected through gaseous distribution valves to the exhaust manifold, allowing users to program and control the process parameters in each chamber. This allows users to define nearly any etching and deposition process parameter, such as gas flow rates, temperatures and pressure levels, to achieve the desired results. The end-point control equipment monitors the process in the chambers. TCP9600 etcher is designed with a microwave-powered plasma generator and an advanced control system. It uses this unit to control both the chamber pressure, temperature, and other process parameters. The microwave generator enables higher-rate processes while allowing multiple chambers to be used. The advanced control machine improves the process stability and accuracy in the etching and deposition processes. TCP 9600 etcher also includes an advanced array of process sensors for measuring both the etch and deposition rates, providing a high level of process control and feedback. Additionally, it can be connected to a computer for remote operation and data storage. LAM RESEARCH TCP-9600 is capable of operating with up to nine gases and can be programmed for up to seven gas flows in the etching chamber. Overall, LAM RESEARCH TCP 9600 etcher is an advanced etching and deposition tool, suitable for both advanced high-volume batch processes and low-cost prototyping. It provides excellent process control, high processing rates, and a wide range of process sensors to ensure the highest quality results.
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