Used LAM RESEARCH TCP 9600 #9177752 for sale

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ID: 9177752
Wafer Size: 8"
Vintage: 1998
Poly etcher, 8" Software version: E1.5 Released SMIF System: (2) Integrated SMIFs Handler system: Wafer notch alignment With (1) spatula Process chambers: (1) Etching (1) Stripping (1) Rinse / Spin dry (1) Loadlock (3) RF Generators: 1250W (1) Manual WVDS controller (1) Remote AC box Main chambers: (1) Turbo pump 1000 litre With controller (1) E-Chuck (1) TCP RF Match (1) BIAS RF Match (2) RF Generators (1) 100 sccm CL2 MFC (1) 50 sccm BCL3 MFC (1) 250 sccm O2 MFC (1) 20 sccm N2 MFC (1) 1000 sccm N2 MFC (1) 100 sccm Ar MFC (1) 50 sccm He UPC Strip chambers: (1) DSQ RF Match (1) Heater paddle (1) RF Generator (1) Manual WVDS controller (1) 2000 sccm O2 MFC (1) 300 sccm N2 MFC (1) 500 sccm H2O MFC With controller Rinse / Dry: (1) Spin dryer with vacuum chuck Transport (1) Wafer notch aligner With spatula (2) Harmonic arm drive assemblies Currently warehoused 1998 vintage.
LAM RESEARCH TCP 9600 is an advanced etcher/asher equipment designed to provide precision patterning and surface processing capabilities. LAM RESEARCH TCP9600 is designed to process wafers up to 300mm in diameter, although smaller wafer sizes can be handled through a secondary adapter. Using a series of high precision and high-speed process modules, TCP-9600 is capable of etch/ash processes including wet etching, dry etching, sputter etching, and more. With an integrated chamber design, TCP 9600 is designed to provide improved through-put and reduced cycle times, compared to traditional batch processing techniques. TCP9600 is equipped with a PLC system for operational control and a variety of process control options, including real-time monitoring and remote network access. Additionally, the unit features a software suite of process recipes to automate process parameter control. LAM RESEARCH TCP-9600 also includes uniformity control and auto-replenishment features to maintain optimal process performance across all processed sites. Built with a range of optional chambers, LAM RESEARCH TCP 9600 can be configured for precision processes including ashing, planarization and trenching. The machine uses a variety of methods for wafer introduction and extraction, such as off-axis wafer retrieval, manual wafer loading systems, contact-less wafer handling, and in-situ SEM end-point control. This allows LAM RESEARCH TCP9600 to offer uniformity performance over the entire field of a complex chamber configuration. TCP-9600 also features precision position detection with two-dimensional imaging and laser range finding capabilities. This allows for accurate imaging of the process chamber and improved tool uptime. Additionally, the asset is equipped with a suite of process recipes that help to automate process parameters for precision etching and ashing processes. TCP 9600 offers high levels of safety and reliability due to an enclosed wafer environment. The model is designed to reduce operational emmissions and meet applicable safety standards, while also providing a clean and dry environment. The equipment is powered by an all-in-one PC/server, which provides dependability and performance over lifecycle reliability. In conclusion, TCP9600 is an advanced etcher/asher system designed to provide precision patterning and surface processing capabilities. By using a host of high precision process modules, LAM RESEARCH TCP-9600 is capable of etching/ashing processes including wet and dry etching, sputter etching and more. Built with a range of optional chambers, LAM RESEARCH TCP 9600 offers uniformity control and auto-replenishment for optimal process performance. This unit also features high levels of safety and reliability due to an enclosed wafer environment, precision position detection, as well as a suite of process recipes for automation.
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