Used LAM RESEARCH TCP 9600 #9197759 for sale

LAM RESEARCH TCP 9600 is a fully automated, high-speed plasma etcher designed to provide superior etch quality over a broad range of materials. The equipment supports both single-sided and double-sided etching, and can be used to achieve plasma etch depths of up to 4 microns with exceptional uniformity. The machine utilizes two frequency-agile RF sources with selectable power levels to ensure superior process control. LAM RESEARCH TCP9600 features an innovative gas delivery system that guarantees consistent gas flow at varying pressure levels to optimize performance. The unit also features an advanced monitoring machine providing real-time data on gas flows, pressures, chamber temperature, and RF power. TCP-9600 is a critical component of LAM RESEARCH Endura™ suite of process equipment for advanced semiconductor fabrication. This sophisticated suite of production equipment includes beamline systems (etch/deposition, ion implantation and laser anneal), to create superior-quality microelectronics. With integrated performance monitoring and process control, LAM RESEARCH TCP-9600 ensures reproducible, ultraclean etch processes. TCP9600 is designed to deliver superior quality and accuracy at high speed. The standard recipe libraries contain a variety of process parameters, including etch rates, chamber pressure,RF power level, gas flow, and temperature settings. The intuitive GUI makes programming it simple, and also provides real-time process monitoring. The chamber is designed to provide a uniform, low-pressure environment for optimal etching, and the ergonomic design means that maintenance is easy and intuitive. TCP 9600 is an excellent choice for manufacturers who need to etch superior quality microelectronic devices. The tool's robust features, reliability, and precision combine to ensure efficient and optimized performance. LAM RESEARCH TCP 9600 is an ideal choice for creating superior quality products with exceptional etch results.