Used LAM RESEARCH TCP 9600SE II #293757794 for sale
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LAM RESEARCH TCP 9600SE II Asher is a high-speed, fully automated plasma etch equipment designed to meet the most demanding etch requirements in the semiconductor industry. It is a dual wafer etcher that can process up to four substrates simultaneously, providing unprecedented performance and throughput. This machine is one of the most reliable etchers available today, capable of routinely delivering production yields of 99.999%. The system is constructed from high-quality aluminum and stainless steel components and is capable of operating at elevated temperatures and pressures. The interior of the chamber is maintained at a temperature of up to 400℃ to ensure uniform process consistency. Operating in a controlled atmosphere eliminates contamination from the outside air and ensures the highest levels of process control. Power to the etcher is provided via a sealed, robust power supply that enables the unit to process wafers with low power requirements. The machine can be configured to use either an RF source or a microwave source to initiate the plasma. The RF source is capable of operating in both high and low frequency modes. Additionally, the tool can be configured for rapid batch processing or for continuous feed operations. The LAM 9600SE II comes with a series of safety features which provide an additional layer of protection to personnel and equipment. These include a liquid nitrogen reservoir with level monitoring, vibration filter systems, pressure sensing systems, and process computer monitoring. The automated plasma etch asset is integrated with various support functions including pre-etch cleaning, cooling, and data logging to ensure optimized process control. The model is also equipped with the latest features for precision etching including advanced scanning algorithms, precise etch windows, and repeatability parameters. This ensures the highest quality levels of etched parts and allows for the process optimization that is necessary for effective production. The LAM 9600SE II equipment is highly versatile and can be adapted to produce a wide range of products. From micro-matching components to high-performance components, it can effectively etch small structures without sacrificing quality. The combination of advanced etch control parameters, monitoring systems, and system-integrated features makes it one of the most dependable etch systems available on the market today.
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