Used LAM RESEARCH TCP 9608 SE #9157867 for sale

LAM RESEARCH TCP 9608 SE is an automated etcher/asher designed for use in semiconductor manufacturing. It is capable of processing up to 300 up to 600 8" wafers at speeds up to 300WPH. This etcher/asher features a 20-slot cassette, provides chamber pressure control as low as 0.1mbar, and offers high-performance etch processes. It is one of the first production etches to feature low-pressure processing and is compatible with organic vapor phase etches. TCP 9608 SE features modular construction and comes with an array of automated components, including a vacuum system, gas and material delivery systems, a control system, and a Human Machine Interface (HMI). It has a two-room design, which eliminates the need for manual robot maintenance and ensures cleanroom compatibility. LAM RESEARCH TCP 9608 SE offers easy process control through its HMI and fine control of chamber pressure and process gases. It also has robust built-in safety systems, including a process gas management system that prevents the release of hazardous chemicals. TCP 9608 SE has a top-down plasma source, which is ideal for creating highly repetitive feature patterns with high uniformity and repeatability. It also has a split chamber design that minimizes the possibility of unwanted chemical processes. The etcher's chamber pressure can be optimized to ensure the highest throughput and lowest chemical usage. LAM RESEARCH TCP 9608 SE delivers superior performance in etching applications such as stainless steel, SiC, TiN/TiC, aluminum, and titanium. Its flexible architecture and range of processing options enable it to be used for both single- and double-sided etching. This etcher/asher is also designed for high-throughput and low-cost wafer manufacturing. Its integrated processes ensure consistently high-quality products with high yields. These features make TCP 9608 SE an ideal choice for semiconductor manufacturers looking for an efficient etcher with the capability to deliver quality results. Its high-performance capabilities and cost-effectiveness make it an excellent choice for conducting various wafer processing tasks.