Used LAM RESEARCH Torus 200 #9235815 for sale

LAM RESEARCH Torus 200
ID: 9235815
Wafer Size: 12"
Etchers, 12".
LAM RESEARCH Torus 200 is a sophisticated etch/ash equipment designed to provide precise etch/ash processing of thin film layers during the semiconductor manufacturing process. Torus 200 utilizes a vacuum chamber coupled with a powerful electron cyclotron resonance (ECR) plasam source system to deliver optimized etch/ash processes including selective (anisotropic) etching with high throughput. The plasama source has 200 watts of power and is capable of working in both Argon (Ar) and Fluorine (F) gas environments in the range of 0.1-50 mTorr. It is equipped with motor driven Focus Ring Driver, frequency programmable power controller, safety interlock switch, and a sources cycle tray with quartz windows. LAM RESEARCH Torus 200 main etch chamber is capable of handling up to two 4" wafers at temperatures up to 150° C, while the load locks can handle up to four 4" wafers in a parallel process. The unit offers simultaneous etch/ash capabilities with dual chamber chemistry--allowing multiple etch/ash steps to be performed on the same wafer for device optimization. The advanced platform is built with flexible recipe parameters and precise process control, as well as an advanced Human Machine Interface (HMI) with recipe management functions. This allows the user to quickly and easily configure the process parameters for their specific etch/ash requirements. Torus 200 also features full isolation of the transport and processing chamber, vacuum process chamber with robust bake-out features, and a remote service terminal to ensure industrial-level production stability and increased user safety. The machine is highly reliable due to its unique hybrid design of air-bearing and magnetic levitation stages, along with LAM's TOYOMOTION control Software for Driver Feedback Control. LAM RESEARCH Torus 200 etch/ash tool provides an efficient, cost effective, and energy conscious solution for semiconductor fabrication demands. It is suitable for etching memory devices, high voltage layers, and specialty layers for ULSI applications. Torus 200 is a peak performer in the industry, providing superior etch/ash quality with excellent selectivity and uniformity. It is the perfect tool for today's dynamic semiconductor manufacturing industry.
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