Used LAM RESEARCH Torus 300K/RF #9395308 for sale

LAM RESEARCH Torus 300K/RF is an etcher/asher designed for production processes in advanced technology nodes. It is a highly configurable equipment that can be used for both front-end and back-end device manufacturing. The system features a 300 mm wafer capacity, has a process gas capability of up to 5 gases simultaneously and features advanced plasma cleaning and etch process technology. The unit comes with a batch-to-batch MDC (Multiple-Drag-Chain) capability to ensure repeatable etch profile control. The Torus 300K/RF etcher has a modular architecture, allowing for easy reconfiguration to meet future needs without impacting the original configuration. The etcher has a massively parallel approach to optimizing etch processes, using multiple steps and parameters in order to deliver the desired etch rate and uniformity. It features temperature-controlled chuck, source, and chamber that maintain precision process control even for the most complex etch jobs. LAM RESEARCH Torus 300K/RF can operate with a wide range of plasma gases and chemistries, enabling perfect control of etch processes. Additionally, it offers complete automation with robot compatible load dock and a cassette-to-cassette protocol that makes the production process easy and efficient. The innovative dual RF power generator technology of LAM RESEARCH Torus 300K/RF allows for operation at both high and low power without compromising on etch rates. Furthermore, the machine is equipped with in-situ and real-time endpoint detection to ensure precise etch depth and uniformity across the entire wafer. An adaptive plasma generator automatically adjusts process parameters in real-time to maintain rapid etch rates and eliminates plasma contamination. The repeatability of the etch processes with the tool is also remarkable, as the accuracy of the etch rate can be as tight as within 1%. LAM RESEARCH Torus 300K/RF can be installed with multiple endpoint detectors, enabling straightforward switch between endpoint strategies as well as between several processes. Additionally, the asset is designed with safety and health features to ensure that the etcher is 100% compliant with the latest industry safety standards. Overall, LAM RESEARCH Torus 300K/RF is a versatile, powerful etcher with precise etch rate control and uniformity capabilities for advanced device manufacturing processes.