Used LAM RESEARCH Torus 300K #9244819 for sale

LAM RESEARCH Torus 300K is a cutting-edge etcher/asher equipment for wafer processing. The system uses advanced pulsed etching and ashing technology for precise wafer etching. It is equipped with a Pulsed Etching and Deposition (PED) technique, which enables precise etching and ashing with high throughput. The unit is capable of creating high-aspect ratio structures on the wafer surface efficiently and accurately, preserving cellular patterns and other features on the wafer while manufacturing it. The machine also includes an Atmospheric Pressure Chemical Vapor Deposition (APCVD) tool with a broad range of deposition materials. The APCVD enables deposition of various dielectric materials with carefully controlled thickness. Moreover, titanium nitride (TiN) is one of the most commonly used deposited materials, it can optimize the Schottky contact between the wafer surface and the electrodes built on it. Additionally, the asset's active gas control feature helps to minimize the environmental impact by minimizing waste; it is designed to minimize the gas consumption, chemical waste, and the footprint of the model itself. The wafer chamber in Torus 300K is of a large size and has a uniform distribution of inputs and outputs. The inputs include an RF input, Helium gas, and mass flow controllers, while the outputs include a deposition robot and liquid cleaners. A photovoltaic cell, a standard part of the equipment, is included to measure the wafer temperature. The system also includes a Pattern Generator which provides precise and uniform patterns as required by the applications. In terms of its design, LAM RESEARCH Torus 300K includes an innovative dual-chamber modular design. Its main features include rapid chamber purging, short cooldown, fast ramping, and precise RF control. The dual-chamber design and rapid chamber purging help to reduce the risk of temperature gradients in the semiconductor wafers during the processing. Furthermore, RF power control provides fine-tuned control of the etching process in order to achieve desired shapes in the wafer. Overall, Torus 300K is an effective and efficient etcher/asher unit designed to meet the highest industry standards. Its precision etching and ashing technologies, coupled with reliable RF control, provide detailed patterns that are consistent with the required applications. Furthermore, its innovative dual-chamber module design allows for fast ramping, safe chamber purging, and short cooldown period, hence ensuring uniform results. High throughput and environmental friendliness are two other major advantages of the machine, thus making it ideal for various semiconductor manufacturing processes.