Used LAM RESEARCH Torus 300S/RF #9395313 for sale

LAM RESEARCH Torus 300S/RF is an etcher / asher device designed to provide high-throughput performance and precise control of process parameters. It features a low-cost, flexible design that enables the user to easily adjust the process flow rate and layer profile to achieve the desired surface quality. The Torus 300S/ RF provides high plasma etch uniformity with its 365mm x 365mm x 25mm wide processing chamber, allowing for higher aspect ratios and thicker etched films. Its advanced cooling system enables more efficient operation, resulting in better etch depth and defect-free surfaces. The device is powered by an advanced RF generator that provides independent ions and radicals that can optimize each etch step with precision. The device supports plasma etching of all dielectric, organic, and metal materials with the additional ability to etch through several layers of materials. The Torus 300S/RF is also equipped with an integrated, fully compliant, trace humidity system that helps ensure superb repeatability and reliable, reproducible plasma etch results. The Torus 300S/RF can be used to produce a wide variety of etch shapes, including VPS trenches, recessed rings, plated vias, and cavities or cutouts. This device is equipped with an automated loading/unloading system and a touchscreen interface for user-friendly parameter adjustment. It is also capable of sustaining high temperatures up to 585°C for quality wafer processing. Additionally, the device boasts a faster, 'power-up to ready-for-etch' time of only 40 minutes. LAM RESEARCH Torus 300S/RF is the ideal etching solution for time-sensitive processes. Its modular design and consistent uniform etching enable repeatable, reliable process results, and provides users with a high-end etching solution at a low cost. Despite its small size, it enables the processing through the thickest films in the shortest amount of time.