Used LAM RESEARCH Torus 300S #9235357 for sale

LAM RESEARCH Torus 300S is an advanced etcher/ der of the latest generation of PVD products from LAM RESEARCH. It is a vertical, benchtop instrument designed for etching, stripping, and patterning of sensitive semiconductor materials. With its extremely fast etching speeds, Torus 300S delivers superior uniformity and productivity. LAM RESEARCH Torus 300S is a powerful, flexible etcher that offers high parallelism and low particle contamination. The etcher is ideal for a variety of applications such as etching of superconductors, MEMS components, and silicon wafers. Its high-speed etching process is suitable for both batch and single-wafer processing, as well as for MEMS. Torus 300S comes equipped with an advanced etching equipment that enables users to process both clean and stripped wafers. It is equipped with two independent chambers, each capable of etching on both sides of the workpiece. The unique design of the system allows for complete uniformity throughout the etching process. The unit is designed to be used in either a batch or single-wafer processing environment. LAM RESEARCH Torus 300S is also equipped with advanced features for monitoring, controlling and adjusting the etching process. This includes an integral four-channel flow meter for optimal gas distribution, as well as a pressure and temperature controller. The machine also includes various safety features such as an interlock tool, emergency stop switch, and an overpressure protection alarm. In addition to the etching capabilities, Torus 300S has a fast-recovery cryostat, a high-resolution imaging asset, and a high-performance PVD model for coatings. The imaging equipment is capable of capturing high-resolution images of the etched surface for easy analysis. The PVD system is an important part of any etching process, as it helps to ensure that the correct materials and thickness are used. LAM RESEARCH Torus 300S is a powerful and reliable etcher/der that offers consistent performance and excellent results. Its combination of advanced features and capabilities make it an ideal choice for those who require a high-performance etching unit for sensitive materials.