Used LAM RESEARCH Torus 300S #9294018 for sale

LAM RESEARCH Torus 300S is an industry-leading etcher/asher that provides sophisticated feature capabilities. This system is the first of its kind used to deliver the combination of innovative etching and ashing technologies for processing complex device structures. The unique process capabilities that come with Torus 300S includes the ability to perform professional-grade etching and ashing of silicon, III/V and a range of other materials. LAM RESEARCH Torus 300S features a large-area etch/ash chamber with high-precision stepper-motor driven stages enabling larger wafer sizes up to 8-inch and advanced etching/ashing sequences. Etching and ashing process capabilities include rotational and vertical patterning, dielectric etch and strip, pattern transfer, anisotropic etching, resistor etching, and gap closure. It also has advanced software and control hardware for chamber controlling and advanced edge-isolation techniques. Torus 300S etcher/asher is designed to meet the most stringent requirements and its high-precision process control ensures repeatability to attain uniformity in every etch step and superior production throughput. It features superior process fidelity that enables users to produce structures at < 5nm in uni-directional patterning with the lowest uniformity impacts. Additionally, its ultra-high productivity enables a 200 to 400 nm exposure range with consistent critical feature performance. The user-friendly equipment provides a range of seamlessly integrated hardware components and functionality compared to its predecessors, making it the ideal system for a variety of etching/ashing applications including advanced CMOS, MEMS, power ICs, power amplifiers, RFID, MEMs, MCMs, and other applications. It can also support specialty etch processes such as high-aspect ratio features, nanochannels, etch dry-etch post-processing and more. Overall, LAM RESEARCH Torus 300S is a premium etcher/asher with the latest technology and proprietary features that make it one of the top etching/ashing tools available for complex device-structure processing. It is ideal for device designers who require the highest precision, throughput, and reliability in their processes.