Used LAM RESEARCH V2 TM #9397706 for sale

LAM RESEARCH V2 TM is an advanced etch/ash equipment designed to perform dry processing with low thermal influence on a substrate. It is a dual magnetron, dual process source system with an advanced control platform to support various process requirements. V2 TM offers excellent protection of critical parts and components while providing superior uniformity and repeatability. LAM RESEARCH V2 TM utilizes both ions and radicals to facilitate etching or ashing of the substrate. It contains two high-performance magnetrons with dual power sources that are tuned to deliver the desired process profile. The dual magnetrons are housed inside a Class 1/Semiconductor Grade (SCG) stainless steel chamber, allowing for efficient heat dissipation, ensuring the temperature is well within the process limits. The unit also features an automated Process Control Unit (PCU) to facilitate the monitoring and controlling of the etcher/asher. Furthermore, a sophisticated wafer handling machine is integrated in the tool to optimize productivity and uniformity. The configurable vacuum asset ensures process and vacuum consistency for the parts being processed. V2 TM etch/ash process is fully computer controlled and monitored, from configuring the process conditions, to gathering process data and optimizing the process performance. Powerful and advanced interfacing software allows it to be easily integrated with existing or future automation systems, ensuring seamless and productive operations. LAM RESEARCH V2 TM also offers superior process repeatability and uniformity, with a production-grade overhead CAE model that minimizes substrate heating. The overhead CAE also allows for easy transport of the substrates and load-lock elements, ensuring smooth and consistent wafer transfers. V2 TM etcher/asher is the ideal choice for cost-effective and reliable high-volume dry processing. With its advanced control and robust equipment components, LAM RESEARCH V2 TM ensures improved reliability and high throughput capabilities.