Used LAM RESEARCH Vector Extreme #9315263 for sale

LAM RESEARCH Vector Extreme is a high-end etcher/asher. It is capable of exposing dense features on advanced substrates such as silicon wafers, compound semiconductor materials, and optical media. Its advanced inductively coupled plasma (ICP) source and state-of-the-art design provide high throughput and exceptional etch uniformity with the highest standards of process repeatability and accuracy. This etcher is equipped with a wide spectrum of process gases, including oxygen (O2), chlorine (Cl2), boron trichloride (BC1), sulfur hexafluoride (SF6), and hydrogen bromide (HBr). The accuracy of the gas delivery equipment with Vector Extreme allows for the precise control of the optimal gas composition for the best etch quality. LAM RESEARCH Vector Extreme is a modular etcher that allows for easy upgrade of the process modules such as a loadlock upgrade to accommodate taller and larger substrates, electron cyclotron resonance (ECR) upgrade for extended etch times, and advanced optical endpoint detection (OPD) system upgrade for real time endpoint detection during etching. Vector Extreme enables advanced substrate cleaning and pre-treatment with its integrated degas and clean tools, and provides high-precision control over the etch process parameters for optimized process results. LAM RESEARCH Vector Extreme is equipped with a spatial filter unit to minimize charged particle contamination by separating the incoming electrons in the plasma and filtering out particles from the reactive radicals within the plasma. Its advanced gas shower head machine ensures that the plasma sheet is evenly distributed across the substrate surface, resulting in uniform exposure of the etchant on the substrate. Vector Extreme is compatible with wafers of various sizes including 300mm and 200mm. LAM RESEARCH Vector Extreme also boasts a high-performance computer and graphical user interface to monitor, store, access, and track etch recipes. It monitors and collects data such as temperature, time, RF power, plasma density, etc. to optimize the etch process and avoid potential anomalies. Vector Extreme is a powerful etcher which is ideal for ultra-shallow or deep etching, and high aspect ratio applications. It is perfect for production, R&D, and advanced research applications.