Used LAM RESEARCH Vector Extreme #9315265 for sale

LAM RESEARCH Vector Extreme is an etching system designed to meet the needs of the semiconductor manufacturing industry. This etch tool is highly configurable and offers precise deposition for a wide variety of materials. It uses combination etch, deposition, and nitrogen plasma techniques to deliver optimal yields and improve etch quality. It is designed with the latest model of advanced plasma source technology, which provides greater accuracy, cost savings and excellent etch uniformity. In addition, it offers a flexible, intuitive user interface which allows for easy setup and operation. Vector Extreme is designed with a dual-plane etch source which provides each etch chamber with its own independent etch source. This ensures the highest degree of etch accuracy across a range of materials with superior repeatability and uniformity. It also comes equipped with a low-power magnetron source complementing the etch process. This helps to minimize power consumption while maintaining an optimum etch process. The tool also contains a unique speed control module which allows for customizing etch and deposition parameters based on specific process requirements. LAM RESEARCH Vector Extreme uses a combination of etch and deposition to achieve desired etch profiles. This is achieved through a unique Dynamic Vacuum Etch Sequence (DVES) technology which adjusts etch rates and deposition profiles for optimal yield, stability and reproducibility. It also relies on a Nitrogen Plasma AZE (NPAZE) process to provide unmatched flexibility and control over the nitride removal process. The system also offers advanced nozzle compensation techniques which allow for more accurate and repeatable etching. This is made possible by complimenting the etch sources with advanced nozzle control, resulting in better repeatability and improved yields. This also allows for more accurate and precise etch rates. Vector Extreme also offers integration with other tool modules, helping to reduce cost and improve process optimization. It can be used with ExpellerTM Technology, which enables etch processes to be driven in real-time. This helps to reduce the production time and improve machine utilization, allowing for faster and more accurate processes. This system comes with a wide range of features and benefits, making it ideal for a variety of process and product applications. It is highly configurable and provides precision etch capabilities, enabling users to gain optimal yield and performance with the minimal amount of resources. With its advanced etch and deposition techniques, LAM RESEARCH Vector Extreme is able to meet the most demanding precision etch requirements.