Used LEYBOLD HERAEUS 301 #293651893 for sale
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LEYBOLD HERAEUS 301 is an etcher or asher which is used in photolithography of micro and nanotechnology devices. It is composed of a short wave infrared quartz lamp, a high-speed scanning galvanometer, and a PLC (Programmable Logic Controller). The quartz lamp emits infrared light which is deflected by an oscillating mirror controlled by the galvanometer. The deflected light is then focused on a substrate where the elements are to be etched or ashed. 301 is a highly accurate etcher/asher that is used for integrated circuit production. It features a precision of ±.01 microns that complies with the highest standards for semiconductor device manufacturing. The device is also very durable, and features an airknife which ensures that all elements are kept clean during the etching or ashing process. LEYBOLD HERAEUS 301 has a wide operating temperature range from 125° to 400°C and an adjustable voltage range from 10 to 35 Volts. The device also has an adjustable depth range and an adjustable width range of 0.1 to 0.9 microns. 301 has a variety of modes that can be selected based on the desired procedure. For example, the etching mode is used for semiconductor device production, while the ashing mode is used for lithography and etching processes. The scan mode can also be set to either fast or slow operation and can also be used on thin substrates. LEYBOLD HERAEUS 301 is controlled by a touch screen interface that provides the user with various settings options, like sub-micron control, UV lamp control, PLC control, and system monitoring. The device also has an onboard computer that facilitates data logging, allowing for automatic and manual control over the parameters. In conclusion, 301 is an advanced etcher/asher that can be used for various photolithography processes. Its precision, durability, temperature range, voltage range, and adjustable depths make it highly reliable and accurate. Its onboard computer and interface make it easy to use and customize for various substrates and processes.
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