Used LFE 104 #9008475 for sale

LFE 104 is an etcher / asher designed for semiconductor processing. This machine is capable of etching thin, conformal layers of material from a variety of substrates, including silicon wafers. 104 utilizes a high power microwave generator for precise depth control along with a variety of process gases to help create the desired surface finish. The equipment also includes a Pulsed Plasma Source (PPS) for etching and other surface treatment processes like passivation and reflow. LFE 104 is equipped with a large chamber, allowing for the etching of large-diameter wafers up to 8'. The chamber is placed between four walls made of raised CE ceramic tiles to help increase the lifetime of etching chambers, while decreasing cross-contamination. Additionally, the machine is designed with many safety features, such as chemical and hazardous material containment, temperature monitoring, and safety lockouts. 104 features a multi-zone process chamber and an adaptive thermal distribution system for improved process stability, along with a high-speed gas and chemical feed unit for improved response times. The machine also offers precision Z-axis scanning with XY motion and high-resolution imaging for both manual and automated processes. A touch-screen operator interface is included for easy operation. LFE 104 is capable of etching or ashing down to marker layers, such as metal and polysilicon, and achieving precise surface finishes and feature densities. Etching processing setups can be optimized for a variety of parameters, such as etch rate, etch selectivity, uniformity, and more, while providing dependable substrate etching profiles. This tool is ideal for advanced processing, as it can achieve high levels of accuracy and repeatability.