Used LRC R4728 #9378288 for sale

LRC R4728 is a medium size bench top etcher or asher designed for general purpose etching or ashing steps in both low and high temperature applications. R4728 has a maximum working temperature of 800°C and a temperature range of 25°C to 800°C. It also has a built in heating element for fast heating up and cooling down times. The etcher is constructed of high temperature resistant stainless steel which ensures an even heat distribution and a long lifetime. The heated chamber is approximately 470mm in length, 250mm wide and 100mm in height, with a usable work space of 380x230x155mm. It's equipped with two large doors for convenient access and sample introduction as well as adjustable thermal insulation and windowed viewing port to observe processes inside the chamber during etching. LRC R4728 is also equipped with a ventilation equipment and a filter system to prevent contamination. R4728 is equipped with an electronic control panel, display unit, and safety features for efficient operation. The control panel allows users to select from one of 10 preset etching recipes or define their own process parameters for customized steps every time. LRC R4728 also benefits from advanced humidity controllers to accurately control the humidity level in the chamber. R4728 is equipped with a number of safety features such as three-way over temperature protection, emergency cut off, thermal shut off valve, and low pressure protection. All of these safety features will help guarantee a safe and reliable operation for sensitive etching processes. LRC R4728 etcher/asher is capable of producing high quality etches with a space resolution of 0.2µm or less and uniformity of +/-10%. The etcher/asher is ideal for use in micro machine manufacturing, printed circuit board processing, semiconductor pulsing technology, ceramics/glass etching, and even medical applications. With its high temperature and precise temperature control, R4728 is a powerful etcher and asher designed for etching complex patterns and processes.