Used MARCH AP 1000 #9243188 for sale

MARCH AP 1000 is an etcher/asher that is specifically designed to provide accurate and uniform etching and ashing results with process consistency. It is optimized for processing micro-sized substrates, such as wafers, filters, and ceramic components. The model is equipped with a high-powered single station for either batch or single wafer processing. The etcher/asher is designed with an advanced process management system that allows for custom process recipes to be saved and applied on the fly. It also features image recognition technology and data analysis capabilities, which allows users to ensure consistent results and repeatable surface quality. Furthermore, the features built into MARCH AP1000 provide an intuitive user interface that simplifies the operation of the machine. The etcher/asher features a brand-new ICP non-toxic plasma source, which is designed to be safe and energy efficient. This plasma source eliminates the need for toxic gas, making it suitable for cleanroom applications. The ICP plasma source technology also ensures uniform etching and ashing results with higher process repeatability and fewer substrate defects. In addition to its high performance and outstanding capability, the etcher/asher also provides enhanced safety features by incorporating nitrogen flow, pressure and temperature monitoring systems, as well as advanced diagnostics capabilities. This allows users to ensure that risks are minimized during the etching and ashing process. AP-1000 is easy to install and set up, and it comes with a variety of options that can be customized to meet specific needs. It is also designed to be compatible with its other high-end products, such as its etching chamber, substrate holder, and robot arm. This allows users to maximize their process efficiency and throughput. Overall, AP 1000 is a powerful and intuitive etcher/asher specially designed to provide accurate and uniform etching and ashing results with process consistency. It offers users the tools and features necessary to optimize their micro-sized substrate processes with ease and efficiency.