Used MARCH Plasmod #9225186 for sale

MARCH Plasmod is a reactive ion etching (RIE) asher equipment designed to perform etching and general ashing processes. It is tailored for high-throughput etching as it is able to process multiple samples simultaneously. The system is controllable via its touchscreen user interface which allows for precise etching and processing capabilities. The unit utilizes a high-frequency 13.56 MHz power supply to generate plasma energy, providing high-power RIE processing capabilities. This energy is also used to target and etch the surface of samples, delivering clean, high-resolution results. The machine further utilizes a gas delivery tool for precise processing. Each process can be fine-tuned using a built-in controller, allowing for various etching recipes to be developed and stored within the controller for future use. The asset also has an internal vacuum pump model, allowing for a quick, efficient change of gases during etching. The equipment operates within a multiple, temperature-controlled vacuum chamber, which allows for higher plasma damage protection compared to single vacuum chamber systems. This further ensures that the results of the etching are of high consistency and quality. Reducing the complexity of protocols is a key feature of the system, allowing experienced users to set up protocols in a matter of minutes. Furthermore, the user interface is tailored to reduce the amount of interlocking and adjusting each parameter when creating a protocol. The unit is compatible with a range of sample materials, including silicon, organics, inorganics, and more. It is capable of etching several types of materials in a single run, allowing greater flexibility for prototyping or sample variation testing. The machine incorporates design features to ensure for optimal etching paradigm. These include reduced reactive ion and plasma contamination, automatic pressure control, and repeatable process results. The tool has been designed with safety, performance, and flexibility in mind, which makes it the ideal partner for any etching process.