Used MATRIX 104 / 105 #293798599 for sale

MATRIX 104 / 105 is a versatile semiconductor processing equipment that combines etching and ashing capabilities in a single platform. Designed for high-volume manufacturing environments, 104 / 105 offers advanced process control and flexibility to meet the demanding requirements of modern semiconductor fabrication processes. This equipment is widely used in the semiconductor industry for etching and ashing processes, such as photoresist removal, dielectric etching, and surface cleaning. MATRIX 104 / 105 features a dual-chamber design, with separate chambers for etching and ashing processes. This configuration allows for simultaneous processing of multiple wafers, improving throughput and efficiency. The system is equipped with a range of process gas sources, including fluorine-based chemistries for etching and oxygen-based chemistries for ashing. This enables 104 / 105 to accommodate a wide variety of process recipes and applications. One of the key features of MATRIX 104 / 105 is its advanced plasma generation and control capabilities. The unit utilizes a high-density plasma source to generate a uniform and stable plasma for precision etching and ashing processes. The plasma source is equipped with RF power supplies and matching networks to ensure optimal power delivery and process stability. Additionally, the machine uses advanced gas flow control and pressure regulation systems to maintain precise process conditions throughout the etching and ashing cycles. 104 / 105 is equipped with a range of wafer handling features to ensure precise and reliable wafer processing. The tool features robotic wafer handling arms that can transfer wafers between the etching and ashing chambers with high accuracy and repeatability. The wafer handling asset is designed to minimize wafer breakage and contamination, ensuring high process yield and reliability. To support high-volume manufacturing requirements, MATRIX 104 / 105 is equipped with advanced process monitoring and control systems. The model features real-time process monitoring sensors that provide detailed information on process parameters such as plasma density, gas flow rate, and temperature. This data is used to optimize process recipes and ensure consistent etching and ashing results across multiple wafers. 104 / 105 also features a user-friendly interface that allows operators to easily program and control process recipes. The equipment is equipped with a touchscreen control panel that provides intuitive navigation and process visualization tools. Operators can monitor process progress, adjust parameters, and troubleshoot issues in real-time, improving productivity and reducing downtime. Overall, MATRIX 104 / 105 is a cutting-edge etcher/asher system that offers advanced capabilities for semiconductor processing. With its dual-chamber design, high-density plasma source, advanced wafer handling features, and intuitive control interface, 104 / 105 is the ideal solution for high-volume manufacturing environments that require precise and reliable etching and ashing processes.