Used MATRIX 105 #9032614 for sale

MATRIX 105 etcher / asher is a highly advanced chemical etching and ashing equipment, used in semiconductor manufacturing and other microelectronic applications. It takes the precision of wet chemical etching and combines it with the processing speed of dry etching techniques. The system employs an ultrahigh vacuum process chamber, with up to six vacuum ports and a load lock unit. This allows for inert, reactive, dry and wet processes to be carried out efficiently and cleanly. Inside the etching chamber, a sophisticated robotics machine is used to manage the etching process. The robot is programmed to move wafers, substrates and other etch components accurately and precisely at variable rates for optimal etch quality. This provides high etch rates at uniform depth and clean along the etch profile. 105 is designed to run both ashing and heavy etching processes. Ashing is a process in which a non-conductive layer of polysilicon, such as an oxide, is removed from a surface. Ashing is necessary to prepare the surface for further processing. Heavy etching is used to create patterns and shapes in wafers, substrates and other materials. Using pulse-mode etching, the tool can precisely control etch depth and completeness for the most efficient and accurate etching processes. MATRIX 105 also has a cold wall feature which helps to reduce particle contamination and improve etching uniformity. The cold walls reduce the heat level within the chamber, which reduces thermal effects and improves profile uniformity. Additionally, for critical etching processes, Gas Flow Endpoint Detection (GFED) can be enabled and monitored to ensure the exact etch end point. Finally, the full suite of control and measurement capabilities makes 105 one of the most advanced systems of its kind. It features easy to use process monitors that can detect and record process parameters such as pressure, temperature, voltage and current. This data can then be stored and analyzed to ensure the best possible results with each etching and ashing application.