Used MATRIX 303 #293758395 for sale

MATRIX 303 is an etcher / asher that is designed to provide fast vapor etching of multiple samples, allowing the user to quickly increase throughput. With its intuitive design, 303 allows for rapid adjustment of etching time, temperature, and gas flow, enabling precise control and handling of various etching techniques. MATRIX 303 is comprised of a two-stage etching chamber, a control/interface, and a peripheral control/interface. The two-stage etching chamber contains three reactors; two for etching samples, and one for isotropic etching of the third sample. This allows up to three samples to be processed simultaneously. The chamber is also capable of providing either a batch etching process or a continuous etching process, depending on user's preference. The chamber is also equipped with an RF RF inductive coil which is used to heat the sample in order to ensure efficient and uniform etching. The control/interface of 303 is segmented into four main areas. These are the Temperature/Pressure, Gas Flow, Source, and Output libraries. In the Temperature/Pressure library, the user is able to adjust the temperature of the etching chamber, the source pressure of the gas flow, and the vacuum level. The Gas Flow library provides the user with the ability to adjust the gas flow rate, along with various parameters associated with the etching process itself. The Source library allows the user to program the processor to the desired source voltage and power. Finally, the Output library allows for the monitoring of the etching process and the output of the etching process to a graphical display. The peripheral control/interface consists of several components that allow for greater accuracy and control over the etching process. These components include: pressure sensors, mass flow controllers, quartz reactors, and temperature controllers. The pressure sensors are used to measure and control the pressure in the chamber during the etching process. The mass flow controllers are used to adjust the flow rate of the etchant gases, depending on the requirements of the specific etching process. The quartz reactors are crucial for the uniform heating of the sample during the etching process. Lastly, the temperature controllers are used to maintain a precise temperature within the chamber. These controllers allow the user to easily adjust the temperature of the system in order to achieve the desired results. Overall, MATRIX 303 is a powerful and reliable etcher/asher that provides users with precise control and handling of various etching techniques. Its intuitive design allows for its easy usage; and its efficiency allows for fast etching processes. With its included peripheral control/interface, 303 is able to provide accurate results every time. It is an ideal choice for anyone looking for an etcher/asher that is suitable for their etching needs.