Used MATRIX System One 105 #9098082 for sale

MATRIX System One 105
ID: 9098082
Wafer Size: 4"-6"
Automatic photoresist stripper, 4"-6" Microprocessor-controlled Single wafer, single cassette Independent control of: Pressure RF Power Temperature Gas flow Substrate position Includes: 600W RF water cooled generator (ENI OEM-6) Optically isolated wafer processing environment Patented interleaved electrode assembly Multi-step (3 Steps + over etch) process program Butterfly valve for more precise pressure control Phase magnitude detector to provide real-time RF impedance matching control (2) Mass flow controllers (TG 5 SLPM, 300 SCCM) Closed-loop control of substrate temperature Temperature range: 80°C to 250°C Pin movement (Up and down).
MATRIX Equipment One 105 is a high performance etcher / asher system designed for specialised plasma etching and ashing applications. The unit is capable of operating in both dry-etch and wet-etch modes, providing precision control of etch depth and uniformity.Machine One 105 consists of three components, including an RF power source, a process chamber, and a controller module. The RF power source delivers up to 2.5kW of power to the substrate, enabling deep etching of up to 5µm depth. Power to the substrate is either direct or through a metal-gasket mask, depending on the etching application. A pressure-sealing chamber ensures perfect vacuum conditions for plasma etching. The tool's proprietary controller module allows precise control of process parameters including plasma etch time, process pressure, total gas flow and gas composition, and allows up to four fumes to be monitored independently. Additionally, a fast-cycling auto-tune functionality ensures optimal processing conditions throughout the entire process. The asset also includes an onboard vacuum pump for easy evacuation of the chamber, as well as software that allows for easy data transfer and control of the parameters. An intuitive user interface with touchscreen operation allows novice users to quickly begin their etching processes. MATRIX Model One 105 is designed for a wide range of etching and ashing applications, including single-layer dielectric structures, shallow trench isolation, metallization, MEMS and integrated circuit production. This powerful equipment is suitable for both research and industrial etching applications. It has been thoroughly tested and proved to meet safety and environmental standards, making it a reliable choice for both amateurs and professionals.
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