Used MATRIX System One 105 #9098100 for sale
URL successfully copied!
ID: 9098100
Wafer Size: 4"-6"
Automatic photoresist stripper, 4"-6"
Microprocessor controlled
Single wafer
Single cassette
Independent control of pressure
RF Power
Temperature
Gas flow
Substrate position
Includes:
ENI OEM-6 RF water cooled generator: 600 W
Wafer processing environment
Electrode assembly
Multi-step (3 Steps and over etch) process program
Butterfly valve
Phase magnitude detector to provide real-time RF impedance matching control
(2) Mass Flow Controllers (MFCs): TG 5 SLPM, 300 SCCM
Closed-loop control of substrate temperature (Temperature range: 80°C to 250°C)
Pin movement: Up and down.
MATRIX Equipment One 105 is a high quality etcher/asher offering advanced material processing capabilities. This advanced etcher is capable of processing a wide range of materials such as silicon, glass, metals, and alloys. System One 105 includes a precision electro-etching station, a rotary station for plasma etching, and a sputter station for ion milling. It operates with an automatic loading and unloading unit that allows for pre-programmed line settings and highly accurate results. This machine features advanced flexibility, allowing it to handle different types of materials in the same cycle. It also features a built-in fault protection tool that avoids damage to sensitive parts and materials. The etcher features an innovative heating asset that ensures materials are heated evenly and to the desired temperature. This ensures an optimal etching result, regardless of material or temperature range. Additionally, the etcher includes a control model that monitors and maintains a consistent etching process for optimal results. It also allows for multiple etching cycles and features auto-tune control functions for greater accuracy and precision. In terms of accuracy and durability, MATRIX Equipment One 105 etcher offers the highest level of precision and durability at an affordable price. The ion milling provides highly accurate and precise results, and the plasma etching offers improved feature definition. This makes the etcher ideal for critical device fabrication tasks that require precision and accuracy. The etcher also includes a powerful programmable control unit, allowing users to access detailed levels of programming and control. This allows for precise and consistent etching, regardless of the material and type of etch. Having been designed for highly specialized processing tasks, the etcher is well-suited for handling microfabricated components. The unit is both compact and robust, making it perfect for use in a laboratory or other production environment. This makes System One 105 an ideal choice for users looking for an easy to use, reliable, accurate, and cost-effective etcher.
There are no reviews yet