Used MATRIX System One 106 #9098085 for sale
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ID: 9098085
Wafer Size: 4"-6"
Automatic photoresist stripper, 4"-6"
Microprocessor-controlled
Single wafer, single cassette
Independent control of:
Pressure
RF Power
Temperature
Gas flow
Substrate position
Includes:
600W RF water cooled generator (ENI OEM-6)
Optically isolated wafer processing environment
Patented interleaved electrode assembly
Multi-step (3 Steps + over etch) process program
Butterfly valve for more precise pressure control
Phase magnitude detector to provide real-time RF impedance matching control
(2) Mass flow controllers (TG 5 SLPM, 300 SCCM)
Closed-loop control of substrate temperature
Temperature range: 80°C to 300°C
Pin movement (Up and down)
Center drawer chuck
Cooling station.
MATRIX Equipment One 106 is a fully automated high-performance etcher/asher developed by Lockheed Martin Advanced Energy Technologies. It is based on MATRIX X-Y linear motor mechanism commonly used in thin-film coating systems. With its high precision and speed, this system is suitable for the application of a wide variety of materials from dielectrics to metals and other materials. The unit is designed to provide a high-molecular uniformity of coating thickness across the substrate and ensure uniform etching/ashing growth rate in all directions. At the heart of the unit is a multi-axis unit of precision X-Y linear motors. These motors move the etch head with 1-microsecond resolution in the X-Y plane. The etch head is placed in a vacuum chamber where etch and ash treatments take place. During etching, the vacuum chamber can be adjusted for optimal etch rate for different substrates. Pressure, temperature, and gas composition are also adjustable. The temperature can reach up to 1000°C and the pressure is adjustable up to a maximum of 200Pa. In addition, Machine One 106 has a built-in, diagnostics-driven, automated testing tool used to ensure the optimal processing of substrates. This asset ensures that the etching and ashing process takes place with maximum precision. The substrate can be chalcogenide, quartz-like, titanium sublimate, silicon dioxide, silicon nitride, aluminum, and other materials. MATRIX Model One 106 is a robust equipment that can be used for fulfilling the needs of the most demanding industrial projects. It is highly accurate, has high repeatability and high precision. The high process tolerances that the system offers makes it suitable for prototyping, functional testing, and product fabrication. It also uses advanced control unit technology to guarantee a high level of uniformity in each etch layer. The etcher/asher is highly reliable and easy to maintain. Its machine backup also helps to ensure that the unit remains operationally capable in any environment.
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