Used MATRIX System One 106 #9098102 for sale
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ID: 9098102
Wafer Size: 4"-6"
Automatic photoresist stripper, 4"-6"
Microprocessor-controlled
Single wafer, single cassette
Independent controller:
Pressure
RF Power
Temperature
Gas flow
Substrate position
Includes:
600W RF Water cooled generator (ENI OEM-6)
Optically isolated wafer processing environment
Patented interleaved electrode assembly
Multi-step (3 Steps + over etch) process program
Butterfly valve for more precise pressure control
Phase magnitude detector to provide real-time RF impedance matching control
(2) Mass flow controllers (TG 5 SLPM, 300 SCCM)
Closed-loop control of substrate temperature
Temperature range: 80° to 300°C
Pin movement (Up and down)
Center drawer chuck
Cooling station
Controller:
Gas flows: Up to 3
RF Power: 100 to 500 W
Process pressure
Absolute endpoint time
Optical endpoint parameters
Gas controller:
Substrate positioning
Pressure controller.
MATRIX Equipment One 106 is a full-featured etching and ashing system for use in semiconductor laboratory environments. It is the perfect solution for those looking for a reliable way to fabricate metal patterning on wafers with fast cycle times, high accuracy, and low cost. This unit is capable of etching and ashing up to 8" wafers at variable thicknesses and mask layers.Machine One 106 uses advanced technological features to ensure the best possible ashing and etching results. Its high accuracy, repeatable process control and fast cycle time makes it a great choice for production and R&D activities. It uses a horizontally rotating etching and ashing platform for improved accuracy. The tool is also integrated with an automatic reversing asset for ensuring proper etching, cleaning, and conditioning of wafers. MATRIX Model One 106 includes an adjustable RF driver power supply, a adjustable load lock, adjustable gas delivery equipment, and adjustable frequency generator. It has an adjustable single or double-cycle etching and ashing mode, so you can tailor the process to your specific needs. The adjustable RF driver also enables System One 106 to be used with different gases and liquid mixtures, so you can operate the unit with a variety of materials. MATRIX Machine One 106 features a low-maintenance and user-friendly design. It has an easy-to-read, intuitive user interface for fast and accurate operation. The tool is capable of operating in a wide range of temperature and pressure environments. It is equipped with multiple safety features and multiple monitoring features to ensure the wafers are processed safely and accurately.Asset One 106 is equipped with a variety of components for efficient and reliable etching and ashing. It has an enclosure designed to ensure the cleanliness of the RF environment and its adjustability allows for tweaking of the etching process. The high accuracy of the model ensures that the etching and ashing process directs materials to the desired areas, with minimal wastage. MATRIX Equipment One 106 offers an affordable and reliable etching and ashing solution for R&D and production uses. It is a great choice for those who want to get fast cycle times and reliable metal patterning on wafers.
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