Used MATTSON Aspen II #293775108 for sale

MATTSON Aspen II is a precision wet etching equipment designed for etching of both metals and materials such as silicon, gallium arsenide, silicon nitride, GaAsP, and other similar group III-V materials. It uses a patented reactive gas cabinet chamber to provide the optimum etching process. The system produces circular, square, and rectangular features with uniformity and precision over a wide range of dimensions. In terms of specification, Aspen II is a compact etching unit which is available in two sizes with up to 16 reactors. It includes two motorized robots with a wide range of capabilities, an advanced etch gas delivery machine, and dual transducers for precise control of fluid flow and pressure. It has a high working pressure range of 0 to 115 PSI and is suitable for etching thicknesses up to 6 microns. It also includes a high-sensitivity optical monitoring tool to ensure precision during etching. MATTSON Aspen II is designed to provide high precision etching with low NH4OH concentrations and to reduce etching of non-target materials. It has advanced algorithms for attaining the highest etch uniformity and precision in a wide range of materials. In addition, the compact design and multiple configurations allow for the etching of up to 16 wafers simultaneously. The asset also features a low particle emission rate, a temperature range from -20 to +50C, and an automatic process testing model which ensures accurate in-line monitoring. Aspen II is an ideal equipment for use in research and production for micromachining and similar applications. Its robust design, innovative control algorithms, and various configurations make it a suitable system for precision etching of all materials. Its versatility, accuracy, and reliability make it a valuable tool for etching processes.