Used MATTSON Aspen II #293807044 for sale

MATTSON Aspen II is a high-performance microcontroller-based Plasma Asher/Etcher Equipment well-suited for both R&D and production processing. The system is capable of etching and ashing in a wide range of gas and process chemistries. This unit includes both an electrode power supply and a process chamber, allowing for a wide range of thin film etch and deposition processes. Aspen II machine has an operating pressure rangeof 1-100 millitorr and utilizes a remote plasma source and RF RF/DC Pulsed power supply to generate a high-density plasma plume. This plume is resilient in the range of methane, argon and oxygen, and other noble gases and ions can be used for specialized applications. The integrated secondary ion mass detectors (SIMS) for plasma ion characteristic analysis, provides users with accurate process curve and result of plasma etching. MATTSON Aspen II's precision-engineered construction and advanced materials used in its construction makes it a robust and dependable tool. The asset also has several protection measures built into its design, such as backflow prevention and vacuum chillers for stream heating, making it ideal for etching tenacious materials, such as quartz, and a variety of semiconductor materials. The model has several safety features that make it suitable for sensitive processes, including deep ultraviolet filtering, a slow degassing feature, and wafer photoresist tracking systems. The automated Aspen II is easy to use and can be integrated into any existing process toolkit with minimal effort. Finally, the high-performance equipment ensures a consistent, repeatable and highly controllable process quality typical of that expected from an industrial-grade etching/ashing system. Its user-friendly graphic user interface (GUI) provides easy programming, pre-processing setup and complete monitoring of the process. MATTSON Aspen II has an excellent mid-range pressure uniformity and is capable of etching at up to 9um precision. Overal, Aspen II is an excellent choice for all etching/ashing applications, allowing users to achieve superior process results with a high degree of repeatability, uniformity and cost efficiency.