Used MATTSON Aspen II #9230723 for sale

MATTSON Aspen II
Manufacturer
MATTSON
Model
Aspen II
ID: 9230723
Wafer Size: 8"
ICP System, 8" Wafer type: Silicon Chamber type: Rear chamber: ICP Chamber Cool chamber Mainframe options: Cassette nest: SMIF Cassette nest Operator interface: Operator interface, 18" with SMIF Paddle selection: Adjustable paddle Panel / Skin color: White Sub-frame: Tall frame Light tower: Pole mount, (4) colors Wafer sensors: Cassettes & paddle sensors standard silicon Paddle O-rings: KALREZ Slotted groove slit door type without regulators Loadlock manometer: 100 Torr Shuttle manometer: 1000 Torr Hinged cooldown chamber Cooling chamber skin Remote operator interface panel Rapid cassette exchange System skins for sub-frame & AGV: Standard skins for TALL sub-frames with EMO No wafer mapping No secondary interface PCB SMIF Option PCB Part: V VERSA COM +4 No robot safety enclosure SECS / GEM-1 Interface: VERSA COM +4 Gas panel type: Top of short frame Cabinet with door Gas panel facilities: Bottom gas feed with CDA regulator Mainframe exhaust options: Ceiling exhaust flange for external hookup & ductwork Vacuum fitting connections: KF50 Vacuum connections standard Shrouded locking EMO type EMO Button guard ring Panel interlock options: Mechanical interlock switch Chamber configurations: Temperature control: Watlow temperature control panel standard ACX 1201 Pressure control with ext PS No MATTSON endpoint system MFC Type: MFC on Core MFC Cal gas: N2 Gas delivery options: Gas 1 / 10000 / O2 Gas 2 / 200 / CF4 Gas 3 / 5000 / N2 RF Components: RF Match: TRAZAR AMU10-D2 (2) RF Generator racks: ENI / RFPP / ADTEC class B generators Generator type: ENI OEM12B Power supply: 208 V, Single phase Cable length: 60" RF Cables with cesar 1312 gens MFC With core chamber Installed: Heater jackets on isolation valve, throttle valve & foreline HEPA Mini-environment with blower & ULPA filter Bracket sensor lift pin (Up / Down), 062-00017-00 Bracket sensor side slit door (Bottom / Upper), 053-00018-00 & 053-00011-00 Pneumatic manifold (4) stations: 2-4 Ports (Middle) 3-8 Ports (Lower) Regulators, 0-150 PSI With gauge for slit doors & lift pins up / Down Power supply: Line frequency: 50/60 Hz Line voltage: 200/208 VAC, 3 Phase, 60 Amp, (5) Conductors AC Power: Mainframe AC box, 208 V, Single phase CE Marked.
MATTSON Aspen II is an etching and ashing process tool specifically designed for advanced process integration. It features process flexibility and high throughput, making it ideal for research, development and device manufacturing applications. Aspen II features many unique process modules which are easily integrated into the alignment, including the quenching, evaporation and etch modules. The quenching module is controlled by high frequency pulsing, allowing precision control over process parameters. The evaporation module uses a high rate, energy efficient, RF heating source for evaporative deposition of materials. The etch module features a free, optional DC loading equipment for direct current etching and ashing, as well as high-speed pre-etch programs and gentle post-treatment. MATTSON Aspen II is designed with a wide range of configurations and temperature ranges. Its Gas Source Injection System™ is capable of delivering gases through a range of calibrated, uniform processes. The integrated multi-ionized vacuum unit creates a clean, low-pressure environment over a range of process steps. All chambers are accessible and interchangeable, ensuring process flexibility and high throughput. Aspen II's intuitive control panel is designed to ensure excellent control of the entire process and allows for easy data collection and reporting. MATTSON software package also provides customized data and recipe management for various processes. The advanced touch-screen interface allows for easy machine navigation, enabling accessibility even for novice users. MATTSON Aspen II is the perfect solution for integrated, advanced process integration. Boasting high throughput, process flexibility, easy data and recipe management, easy access and wide range of configurations, it is the ideal tool for production or research applications.
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