Used MATTSON Aspen II #9401067 for sale
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ID: 9401067
Wafer Size: 8"
Vintage: 1994
Dryer, 8"
ICP Chamber
Chamber Process: Ashing
GEM and SESC Interface
Cool down chamber
Cassette stage
Transfer robot
AC Power box
Signal tower
(2) ADVANCED ENERGY CESAR1312 RF Generators
DC and AC Power supply
Chuck type: Standard
MILLIPORE Manometor
Chamber Pump
Gate valve
Thermocuple
Heater
Pressure switch
Board
(3) Control boxes
Power tap
Hard disk
Throttle valve
EMO
Pipes
Cable
LCD Monitor
Control panel
PC Included
Missing parts:
Robot blade
Robot extention geneva
Robot extention gear
Robot rotation genva
Robot rotation gear
Robot motor
Side slit door
Shattle pressure gauge
Shattle chamber slit door
Shattle motor
Power supply: 208 V
1994 vintage.
MATTSON Aspen II is a state-of-the-art electrochemical etching/ashing equipment designed for use in a wide range of applications within the semiconductor industry. The system features advanced electronics for precise control of etching and ashing processes, allowing for flatter, thicker layers on wide-ranging substrates. It comes equipped with an advanced nozzleless bath unit, which provides precise and precise control of the stripping process, allowing for predictable and repeatable results. Additionally, the integrated self-cleaning machine keeps the tool operating at peak performance by automatically eliminating contamination build-up. The asset is engineered to be reliable and efficient, from its innovative nozzleless solution to its fast-etching capabilities. Aspen II is capable of processing up to 50 wafers per hour at a maximum temperature of 475°F and can be used for a variety of materials, including silicon, aluminum, tungsten and titanate. The integrated software interface allows users to optimize settings and adjust model settings for efficient operation. Furthermore, it offers an eco-friendly solution, limiting solvent emissions, thanks to its high efficiency vacuum pump and gas flow sensors. This helps to ensure that etching and ashing processes are in compliance with environmental and safety regulations. The innovative design of MATTSON Aspen II also facilitates maintenance, allowing easy access to all internal components. In addition, the equipment's controller manages the etching process from the source to the substrate, provided a precise and repeatable deposition and removal rate. Furthermore, the precision gas delivery system ensures precise and uniform gas flows for optimized etching and ashing processes, helping to reduce process variation and yield better results. Aspen II is a powerful and reliable electrochemical etcher/asher unit. It provides precise and repeatable control for etching and ashing processes, resulting in flatter, thicker layers on wide-ranging substrates. In addition, the machine's sophisticated electronics ensure reliable and efficient performance, while its integrated self-cleaning tool and gas flow sensors ensure compliance with environmental and safety regulations. Furthermore, its innovative design allows for easy maintenance and precise gas delivery, resulting in superior results with minimal process variation.
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