Used MATTSON Aspen III #9190468 for sale
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ID: 9190468
Wafer Size: 12"
Vintage: 2008
Light etcher, 12"
No multiple level security
No pressure pascal unit
No TM pump share
Maximum forward RF power (Set point and read back) head A to F: 3000
Maximum reflected RF power (Read back) head A to F: 3000
RF Generator type chamber 1, 2 and 3: AE RFG-3
No wafer ON paddle sensors
UNIVERSAL Remote pump
No LP access mode indicator
No CHI VAT valve
CHI Gas box
CH2 and CH2 Gas box: UNIVERSAL
No CH1 VAT valve
CH2 and CH3 VAT Valve
(2) Loadport load LED indexes
(5) Loadport unload LED indexes
Loadport manual mode LED index
(9) Loadport handoff button indexes
(8) Loadport Err LED indexes
No CH1 manometer analog cable
CH2 and CH3 Manometer analog cable
No CH1, CH2 and CH3 fast preheat
Fast preheat maximum VAT valve angle: 100
No CH1, CH2 and CH3 back robot Z-motion enabled
No CH1 source cooling
Communications port: 36 (2 NT)
Light curtain type: System
RF Strike option: Fix strike
RF Strike timeout: 5S
Hd-Hd Plasma strike timeout: 3S
No check wafer slide sensor
Chiller
Routing type: Standard
Lite etch settings
No independent lift pin monitoring
Tag reader type: Hermos 1
(2) CH1, CH2 and CH3 N2 Gas lines
Start verity interface: Manual
MFC Check: Standard
(2) Gas purge lines
No 3-stages pump down for load-lock
No E84 AMHS stop bit
No request host time set
No LL wafer cooler
Chiller signal display: Chiller
No LL pump purge
No LL cross flow
No UPC
No wafer shift sensor
Run time (Min): 384,009
Wafer count: 463,919
Total run time: 3,242,784
Total wafers: 6,534,874
MFC Type: Unit 1661
Disks: MC and GUI
Gases: O2, N2, CF4, H2/N2: 4%
2008 vintage.
MATTSON Aspen III is a high precision dry-etch asher that is designed to provide a wide variety of high quality etch jobs for silicon, diamond, and other materials requiring precision etching. This asher is made with a robust stainless steel frame for unmatched reliability, and its vertical chamber design boasts a large 6-inch thermal field with adjustable etch rates. With Aspen III, users are able to etch through various material layers with precision and accuracy. MATTSON Aspen III is equipped with an advanced pulsed etch power supply that allows for repeatable and precise etch results. This machine comes with a variety of etch chemistries that can be used to effectively etch through various materials, including silicon, diamond, gallium nitride, and many others. Additionally, this asher has an advanced laser assisted etch function that provides precise markings and image fidelity directly onto the substrate. Aspen III features a fully automatic operating mode that enables users to easily set up and program repeat etch jobs with a single button press. It also has an intuitive graphic user interface that allows users to quickly ascertain current etching information, including quartz temperature, pressure, and plasma density. This ensures that users are able to accurately and consistently maintain process parameters. MATTSON Aspen III is equipped with an integrated plasma ignition power supply that prevents problems related to contamination or over-etching. This etch asher is also fully compliant with vacuum-level gas laws and is designed to maintain regulatory requirements and safety protocols. It also comes with features such as auditing, process alarm monitoring, and auto shutdown capability so that users can work with confidence. Aspen III is capable of achieving excellent etch results due to its precise adjustable thermal field and its optimized high voltage power supply that can range from 5 volts to 100 volts. These features, along with the ability to set repeat etch jobs, make MATTSON Aspen III an excellent choice for anyone needing high quality etch results. It is the perfect solution for etch processes on difficult materials, such as silicon or diamond, and offers superior quality results at a low cost.
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