Used MATTSON Paradigm SI #293820191 for sale

MATTSON Paradigm SI is the latest in electrochemical etching technology, and is designed with precision and high-performance in mind. The large-area etch process is characterized by its high density features and low-cost process materials. The optimum single wafer process is optimized for 1 µm square array etching at an excellent total yield and perfectly eliminating any risk of edge pull-off or related electrical defects. The efficient single-wafer processing of Paradigm SI results in significant savings in rework costs associated with double- or triple-pass processes. MATTSON Paradigm SI is ideal for applications that require high-precision etch features with highly uniform profile and cross-sectional characteristics. This process also allows for high aspect ratio etches to be achieved by using specifically designed window masks that can be used in conjunction with multi-level etch processes. The exceptional uniformity of the etched features makes this etching tool ideal for both MEMs applications as well as microfluidic devices. The equipment is also capable of conducting both dry and wet chemical etching operations depending on the etch process requirements. The dry etch portion of the process is done using a low-frequency, high-voltage AC power supply that operates using a two-stage process; the first stage focuses on reducing the state of surface cleanliness, while the second phase is the etching phase. The wet etch process is done using a combination of highly selectable chemical liquid chemistry, such as hydrofluoric acid, sulfuric acid, etc. Paradigm SI also benefits from an intelligent monitoring system which monitors the whole etch process, from substrate preparation to end-product. This ensures repeatability and predictability in both laser ablation and etched results, as the monitor continually provides feedback on the etch rate, sputter yield, and other related parameters. The unit is also integrated with a supervisory control machine for control of all tool functions and parameters, allowing the user to track etching progress over time as well as complete full process traceability. Overall, MATTSON Paradigm SI is a highly sophisticated etcher designed with features and capabilities that make it perfect for applications needing reliable, repeatable, and reproducible etched feature results. This asset allows for a variety of etch processes, is capable of handling high aspect ratio etches, and offers excellent process control and traceability.