Used MATTSON Paradigm SI #9231982 for sale

MATTSON Paradigm SI
Manufacturer
MATTSON
Model
Paradigm SI
ID: 9231982
Wafer Size: 12"
Vintage: 2012
PR Asher system, 12" 2012 vintage.
MATTSON Paradigm SI is an etcher/asher used for thick and thin-film circuit processing. This equipment provides a versatile platform for performing various types of etching and ashing processes. The system features a 'floating' process chamber, which eliminates the need for a vacuum source, resulting in a clean and repeatable process environment. The two-part design consists of a rotating six-chamber etch and ashing station and a process station, isolated from the vacuum environment of the etch/ash chamber by a raised wall. The six etch and ashing chambers of Paradigm SI are designed with customizable RF and microwave sources, allowing the user to set up multiple processes in a single batch. The chambers also include digital power control for optimizing the process and process control to perform End Point Monitoring (EPM). The seven process stations of MATTSON Paradigm SI give the user the ability to deposit up to seven metal layers in a single run. The process stations are configured for sputter deposition, electro-deposition, and electroless deposition. In addition to the etches and ashes, Paradigm SI offers a variety of process monitoring and control capabilities, including an advanced software package for precise process control. This allows recipes to be written into the unit and results to be tracked in real-time, enabling the user to easily modify and program processes without having to manually adjust control parameters. MATTSON Paradigm SI is also able to perform repeatable processes by utilizing an advanced nozzle assembly consisting of a three-axis nozzle mount, dual-axis knife-edge handler, and adjustable ceramic flow cups. This allows for consistent uniform etching and processing of thick and thin film layers, resulting in reliable high-yield circuit processing. The unique built-in cleaning mechanisms of Paradigm SI help to maintain the process chamber, nozzles, and accessories throughout each process run. The machine offers automatic cleaning capabilities for both the interior and exterior of the process chamber, as well as for the nozzle assembly. This provides an efficient and consistent environment for high-quality circuit processing and minimizes the risk of cross contamination. Overall, MATTSON Paradigm SI is a highly advanced etcher / asher tool with a number of advanced features and capabilities. Its precise and repeatable processes enable users to achieve consistently reliable and high-quality circuit processing. Its versatility and advanced monitoring capabilities also make it an invaluable tool for modern circuit fabrication and process control.
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