Used MATTSON Paradigm SI #9241278 for sale

MATTSON Paradigm SI is an advanced etcher/asher designed to provide efficient, precise and process-controlled etching and/or ashing solutions for materials research. It is a highly efficient, robotic-based, batch processing equipment, utilizing an innovative closed-loop control system to selectively etch or ashing wafers made of single or multi-layer materials. Featuring advanced multi-chamber process capabilities, Paradigm SI provides outstanding temporal and spatial control of the process parameters including gas flows, temperatures and plasma power. The main chamber features an integrated RF top-loading source with independent and isolated power supplies for each source. Each top loader module contains a focused, closed-loop, collimated extraction unit that evenly distributes the plasma across the wafer within the processing chamber. The chamber also contains a simplified lift/cassette machine for easy wafer loading/unloading. In addition to the top loader, MATTSON Paradigm SI also features a load/unload lift mechanism to enable precise gas delivery and quick wafer placement. This top-loading tool allows for the adjustment of the chamber pressure as needed during processing, minimizing the risk of chamber contamination and sustaining total control of the wafer etching/ashing process. The chamber also contains dynamic thermal control, allowing the wafer temperatures to be precisely set for all conditions within the chamber, including overpressure. This ensures a consistent, efficient etch/ash process and minimizes time spent managing exposure to elevated temperatures. In addition to its advanced multi-chamber process capabilities, Paradigm SI also provides several additional etching and ashing functions including the ability to easily select processing of single or multiple wafers as well as multi-step processing. It also offers multiple high-capacity consumables, including different consumable wafer types, specifically engineered to withstand the process temperature and RF environment. For added control, the asset also features a variety of wafer monitoring protocols, enabling users to observe wafer results in real time, as well as automatically monitor and control key parameters of the etching and ashing processes such as pressure, flow rate, power and temperature. This advanced process monitoring capability makes MATTSON Paradigm SI a highly reliable and efficient model, enabling users to create high-quality etched/ashed materials quickly and efficiently.