Used MATTSON Suprema #9358706 for sale

MATTSON Suprema is a reliable, durable, and high-precision etcher/asher designed for various applications in the wafer fabrication process. It is engineered to provide superior temperature uniformity and optimal critical dimension control to meet the demanding requirements of the semiconductor industry. The equipment incorporates a polarized plasma source and a quartz chamber to modify and improve etching rate uniformity and profile control. Design features also include high-current performance, programmable current step, and a high vacuum system for advanced etching results. Suprema features industry-standard user interface controls with a joystick controller for easy operation and module selection. The process gas is delivered by a multi-mass flowmeter and controlled for precise etching performance. The etcher has a two-stage particle filtration unit which contributes to superior process repeatability and reduces contamination on the etched substrates. The machine is compatible with a variety of gases such as sulfur hexafluoride, SF6, chlorine, and so on, plus advanced process control features, including active displacement pumping, automated recipe loading, and a sample rotation tool. MATTSON Suprema facilitates the efficient and reliable etching of various substrates. It has the power and functionality to etch single or multiple wafers at once and achieves superior etch rate uniformity, higher yield, and improved process stability. The two-stage particle filtration tool ensures optimum etch stability and reliable results. The asset also features continuous flow monitoring, online analysis, automatic tuning, and recipe storage. Suprema defines standards in etching performance. It combines high quality components and a modular design to meet the demands of the semiconductor industry. The etcher's temperature uniformity is excellent for precise critical dimension control while the high-current performance and programmable current step contribute to etch rate uniformity. The reliable cleaning model helps to reduce contamination on the etched substrates. The user-friendly controls, automated recipe loading, and sample rotation tool make the equipment ideal for a variety of applications in the wafer fabrication process.