Used MAXIS 300LAH #9258012 for sale

MAXIS 300LAH is an advanced etching and ashing equipment designed for high throughput applications. This system is equipped with a 300 nanometer gallium ion source and a high speed pulse control to deliver superior etching and ashing results. 300LAH consists of a compact four-axis robotic controller, an automatic wafer loader, a multi-mode wafer handler, and a 300 nanometer Ga ion source. The wafer handling unit allows for simultaneous etching and ashing of two wafers with a throughput rate of up to 500 wafers per hour. The auto loader allows for quick loading of up to 15 wafers at a time, while the multi-mode wafer handler enables the handling of different wafer patterns without additional manual setup. The 300 nanometer Ga ion source is designed to produce high-quality etching and ashing results. The ion source is equipped with a high temperature and high pressure jet skimmer to produce a uniform, high-flux output. It also features a proprietary electron impact emitter that produces a beam of high-energy ions that penetrates the surface of the wafer, resulting in improved etching and ashing results. In addition, the beam production can be adjusted to produce different surface effects for a variety of results. The advanced autofocus machine helps improve process uniformity and accuracy. The tool features a self-adjusting stage-to-focal plane gap for precise control over the beam's shape and direction, ensuring the ions hit the wafer with the precision needed for a quality etching and ashing process. MAXIS 300LAH is built with superior safety features, such as ion chamber purging, asset diagnostics, beam and wafer safety feedback systems, and an alarm model. All of these features allow for safe and reliable operation by providing a secure environment for users. In conclusion, 300LAH is a powerful multi-functional etcher and asher equipment designed for high throughput applications. The 300 nanometer gallium ion source, autofocus system, and advanced safety features allow for an efficient and accurate etching and ashing process. This unit is ideal for large-scale production and research purposes.