Used MAXIS 300LAH #9409612 for sale

MAXIS 300LAH is an etcher/asher designed to perform effective reactive ion etching and ashing of various materials including silica, silicon, glass and metals. The equipment is engineered to achieve excellent etching profiles, providing uniform and reliable results in a competitively priced platform. 300LAH is equipped with a wide range of features for various substrate materials and etching/ashing applications. It is equipped with a 300mm quartz boron nitride (QBN) process chamber with a maximum working pressure of 200 mTorr, making it suitable for different etching and ashing processes. The process pressure control is achieved by a multi-stage linear roughing pump and a turbopump combination with a base pressure of 30 mTorr. The system also features an etch source, differential pumping, remote sensing and manual sample loading, making it suitable for a wide range of applications. The etch source on MAXIS 300LAH is a dual turbo molecular pump, boasting an adjustable horizontal and vertical orientation allowing for easy transformation and an etched pattern orientation optimization. It is equipped with a 2 kW RF generator, capable of delivering up to 2200 Watts of power, provided by a 500-VDC power supply, allowing for maximum flexibility in etching and ashing parameters. 300LAH also benefits from a precision diaphragm front load lift allowing substrates and wafers to be loaded in a secure environment. Its tilt-and-turn chamber rotation unit is also a significant advantage, allowing wafers to be conveniently maneuvered for straight and uniform etching. In order to ensure a safe environment for users, MAXIS 300LAH is equipped with an integrated emergency button, which immediately and close the chamber and shut down the power supply when triggered. The machine also benefits from a complete Interface, accessible via an intuitive touchscreen display, allowing users to oversee and precisely control each step of the process. Overall, 300LAH is an efficient and cost-effective etching/ashing tool suitable for various applications such as wafer processing, electronic components, ceramic pressure plates and even optoelectronic devices. Its comprehensive features and intuitive interface make it the perfect tool for any etching/ashing requirements.