Used NEMST 2002 #9244938 for sale

NEMST 2002
Manufacturer
NEMST
Model
2002
ID: 9244938
Vintage: 2008
Plasma cleaners 2008 vintage.
NEMST 2002 is an etcher/asher, or plasma etching tool, designed for fabrication of complex semiconductor structures and devices. It functions by utilizing an electro-magnetic field to create a high energy plasma. This field is generated by a 500 kHz, 40 mT radiofrequency (RF) power source, which creates a uniform electric field around the sample. 2002 consists of a stainless steel chamber, an RF coil surrounding the chamber, a vacuum system with a single gas feed, and a sample or substrate to be etched. The stainless steel chamber is cylindrical in shape, with an inside radius of 85 cm and a height of 30 cm. The RF coil creates the electric field, while the vacuum system maintains the pressure within the chamber at a safe level. The gas feed supplies different gases depending on the type of etching to be applied. The etching process begins when a low pressure (5-7 mbar) is applied to the chamber and the RF coil is switched on, creating a uniform electric field. This field causes the charged particles within the chamber to accelerate towards the sample, releasing energy and establishing the etching process. The etching rate is variable, ranging from 10 to 100 nm/min. The gas species used for etching, as well as the etching conditions, are customizable and can be programmed into NEMST 2002 for precise etching. Additionally, 2002 can be used to perform selective etching, where certain areas of the sample are etched at different rates. NEMST 2002 is capable of storing up to 2900 recipes for etching and can be easily programmed. 2002 is also equipped with safety features such as a warning system to alert the operator if the pressure, temperature, or RF transmission is not within the safety limits. In conclusion, NEMST 2002 is a reliable and efficient etcher/asher designed for fabrication of advanced semiconductor structures and devices. Its RF coil generates a uniform electric field which allows complex processing on samples within the chamber. Additionally, 2002 is user-friendly, making it well-suited for educational and industrial applications.
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