Used NEMST 2002 #9244939 for sale

NEMST 2002
Manufacturer
NEMST
Model
2002
ID: 9244939
Vintage: 2012
Plasma cleaner 2012 vintage.
NEMST 2002 is an advanced etcher/asher designed specifically for wafer processing. It features high throughput with a maximum process time of 8s, an efficient, reliable single-stage process, and maximized production yield. 2002 motivates a true single-stage process, allowing for superior etching speed and reduced particle defects. Its advanced process control equipment uses a pre-set parameters for consistent performance and offers flexibility to tailor process conditions to specific materials. The heater is temperature-controlled for accurate and consistent temperatures with a high precision positioning system for exact target repetition. The main chamber accommodates up to 12 wafers. For protecting materials from oxidation, the chamber also utilizes an inert gas, typically nitrogen or argon. It is customizable for use with varying etchant formulations, including wet and dry etching solutions, and features an auto pumping unit for rapid etching. To ensure uniformity, process gas flow is adjustable and controllable through the use of a proportional valve, and an embedded thermocouple ensures critical temperature monitoring throughout the etching process. NEMST 2002 also features precision imaging and digital image processing. Using digital imaging techniques, this unit can accurately monitor wafer profile and endpoint detection throughout the etching process with high accuracy. Accurate end-point recognition is further enhanced by the ultra low temperature measurement machine, which monitors the temperature over the entire wafer, thereby ensuring a uniform process end-point. The unique design of 2002 is manufactured using advanced engineering designs. The components are corrosion-resistant and chemically resistant and, the unit is designed with precise measurements for high performance and consistency. The lightweight design, combined with high process speed and reliability make NEMST 2002 an ideal option for wafer processing. Its ergonomics also allow for convenience, portability, and user-friendly operation.
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