Used NEXSO NV10 #9130696 for sale
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ID: 9130696
Wafer Size: 5"
Vintage: 2002
High current ion implanter, 5"
Main power supply (all UPS power supply) = 208V3 phase 5-wire 135A
Grounding 1 ohm, electric power 45KVA
Cooling water inlet
Cooling water outlet
N2 Gas
CDA
Argon special gas
Boron specialty gas
General exhaust
Toxic exhaust
General vent
2002 vintage.
NEXSO NV10 is an etcher/asher, a device that combines the functions of an etcher and an asher in one machine. It is designed to be used in the fabrication of microminiature components, such as microelectronic integrated circuits (ICs). NV10 is an automated wet etching and ashing equipment for single side and double side via etching and process analysis, which is available as a stand-alone system or integrated with a PVD unit. It consists of three main components: the etcher/asher, tray, and components rack. The machine is capable of etching and ashing various substrates at a rate of up to 100 mm/minute. NEXSO NV10 is designed to provide precise process control with a maximum etching depth of 1 µm and a minimum etching time of 5 minutes. It also features a dynamic ashing tool that allows for both programmed and manual ashing. Thermal, chemical, and optical sensors ensure uniform etching and ashing of all the components. The machine is equipped with a Windows-based operating asset, allowing operators to programme multiple etching recipes and adjust process parameters while monitoring real-time process data. It is also equipped with an enhanced vacuum insulation mechanism that helps to reduce the amount of thermal loss. NV10 is a compact and versatile etcher/asher that can be used for both single- and double-layer etching. Additionally, it is provided with an Ethernet connection to allow for integration with other process tools and the ability to programme a variety of etching recipes. Overall, NEXSO NV10 is a powerful and efficient etcher/asher that is extremely accurate and can be used to consistently produce high-quality IC prototypes and components. Its combination of automated processes and precise control makes it ideal for use in semiconductor and other microelectronic device fabrication. Its ability to integrate with other tools and provide detailed process data makes it even more appealing for commercial and industrial applications.
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