Used NORDSON MARCH AP-1000 #9196956 for sale

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ID: 9196956
Plasma system.
NORDSON MARCH AP-1000 is an etching machine designed for a variety of semiconductor etching processes. It features an integrated vacuum equipment and a control system that allows the user to select parameters such as end-point detection and substrate temperature. The etching process takes place in a quartz-encased chamber, where the substrate to be etched is heated to a high temperature and exposed to reactive chemical gases. NORDSON MARCH AP 1000 features a high-efficiency, low-pressure deposition unit capable of delivering precise, uniform results. This machine also provides rapid cooling and uniform etching profiles, making it ideal for advanced applications such as deposition, annealing, and reactive ion etching. Additionally, the etcher includes a process chamber with a capacity of up to six 300 mm wafers, as well as a coolant and gas flow tool. AP-1000 also incorporates a temperature control asset for controlling the temperature of the substrate. The graphical user interface on AP 1000 is intuitive and allows users to easily control the etching process. The Chamber Control Interface permits users to customize process parameters such as pressure, temperature, gas flow, bias material composition, as well as gas injection rate and duration. The ChamberView software visualizes the front and bottom plan views of the substrate, during the etching process, in real-time. In terms of safety, NORDSON MARCH AP-1000 features an integrated air-purge model which ensures that harmful gases and reaction products such as metal halides are automatically removed from the process chamber. The etcher also comes with a complimentary cooling equipment to prevent overheating, as well as an emergency power shut-off switch. Additionally, NORDSON MARCH AP 1000 has a built-in Module Interlock system that prevents process interruption. Overall, AP-1000 etcher offers a highly reliable, easy to use platform for a variety of semiconductor etching processes. Its patent-pending chamber unit ensures uniform results across multiple wafer diameters, while its high-efficiency deposition machine provides quick cooling rates and precise etching profiles. AP 1000 is also equipped with user-friendly graphical user interface and integrated safety systems that ensure safe and efficient operation.
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