Used NORDSON / MARCH AP-600/300 #9401924 for sale

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ID: 9401924
Vintage: 2015
Plasma system 2015 vintage.
MARCH AP-600/300 is an etcher/asher for use in the semiconductor industry. It is designed for the production of components that require ultra-high-precision etching and ashing processes. This etcher/asher features a vacuum capability up to 10-6 torr, enabling the user to precisely deposit material onto the substrate with minimal risk of contamination or defect. The etcher/asher also features a dual frequency plasma generator, with frequencies ranging from 600 to 300 kHz, that creates a high-ionic density process with a maximum sustained power up to 15 KW. NORDSON AP-600/300 is equipped with a digital touch-screen controller, providing easy-to-use, intuitive control of the etcher/asher's functions. The user can select the type of etch process required, including CF4, CF2Cl2, LASMA, N2O, O2, and H2, and the system will automatically adjust the power and pressure settings for each process. A wide range of parameter settings can be programmed, allowing for precise control over etch rates and other process variables. The precision etching and ashing provided by NORDSON / MARCH AP-600/300 is ideal for the production of semiconductor components, including high-precision V-grooves, interconnects, gate etches, and through-holes. The etching/ashing process can be offset precisely in the X-Y plane for a wide range of materials, including polysilicon, aluminum, SiO2, Si3N4, and bonding layers. In addition, the etcher/asher is compatible with a range of accessories, including a set of universal programming templates, a variety of process-specific sample trays, and a number of automated loading and unloading arms. The etcher/asher also features a distortion-free imaging system, providing the user with a clear, detailed view of the substrates being processed. Overall, MARCH AP-600/300 is an excellent etcher/asher for precision semiconductor production applications. Featuring a wide range of process settings, automated loading/unloading arms, and a distortion-free imaging system, this etcher/asher is designed to meet the demands of even the most complex etching and ashing requirements.
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