Used NORDSON / MARCH AP-600 #293775139 for sale

ID: 293775139
Vintage: 2011
Plasma system 2011 vintage.
NORDSON / MARCH AP-600 is a highly advanced etcher/asher equipment designed for precise and controlled plasma processing of substrates in semiconductor fabrication and other microelectronics industries. This state-of-the-art system offers a wide range of capabilities for cleaning, etching, and surface modification of various materials used in semiconductor manufacturing, photovoltaics, and other high-tech industries. With its advanced technology and user-friendly interface, MARCH AP-600 delivers consistent and reliable results for high-volume production environments. At the heart of NORDSON AP-600 unit is a sophisticated plasma chamber that can accommodate various substrate sizes and shapes, from wafers to flat panels. The chamber is equipped with cutting-edge plasma generation and control technologies, including high-frequency RF power supplies, gas flow controllers, and advanced process monitoring sensors. This allows for precise control over plasma parameters such as gas composition, pressure, temperature, and power density, ensuring optimal process conditions for different applications. One of the key features of AP-600 is its ability to perform multiple process steps in a single machine, eliminating the need for transferring substrates between different tools. The tool can be configured with various process modules, including reactive ion etching (RIE), plasma etching, plasma cleaning, and plasma activation, enabling a wide range of applications such as photoresist stripping, descumming, surface activation, and isotropic etching. NORDSON / MARCH AP-600 offers a high degree of process flexibility and customization to meet the specific requirements of different applications. Users can choose from a wide range of process gases, such as oxygen, nitrogen, argon, and fluorine-based gases, to achieve the desired etching or cleaning chemistry. The asset also supports different plasma modes, including inductively coupled plasma (ICP), capacitively coupled plasma (CCP), and downstream plasma sources, allowing for precise control over ion energy and density for different process requirements. In addition to its advanced process capabilities, MARCH AP-600 is equipped with a user-friendly interface and intuitive software control model that simplifies operation and monitoring of the equipment. The system features a touchscreen display, parameter setting tools, real-time process monitoring, and data logging capabilities, allowing users to easily set up processes, monitor performance, and analyze process data for process optimization and quality control. NORDSON AP-600 is designed with a focus on reliability, uptime, and ease of maintenance to ensure continuous operation in high-volume production environments. The unit features robust construction, high-quality components, and advanced safety interlocks to prevent accidents and ensure operator safety. Regular maintenance and service procedures are designed to be simple and efficient, minimizing downtime and optimizing machine productivity. In conclusion, AP-600 is a cutting-edge etcher/asher tool that offers advanced plasma processing capabilities, process flexibility, user-friendly operation, and high reliability for a wide range of applications in semiconductor fabrication and microelectronics industries. With its state-of-the-art technology and advanced features, NORDSON / MARCH AP-600 is an ideal choice for semiconductor manufacturers and other high-tech industries looking to achieve precise and controlled plasma processing for their products.
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