Used NORDSON MARCH ProVIA #9374850 for sale

NORDSON MARCH ProVIA is a dry etcher machine designed for semiconductor and optoelectronic processing. ProVIA is used for deep etching, planarization and patterning of a wide range of materials from the silicon wafer to glass. It has a low particle environment, a vacuum environment and a high processing power. NORDSON MARCH ProVIA is a reliable, stable and high-precision equipment. It is highly configurable for a variety of applications, and includes a tunable RF power supply and vacuum chamber. The main components of the system are a process chamber, load/unload modules, RF induction power source, ancillary hardware and process control systems. ProVIA's process chamber is equipped with 40 open ports and 5 sample sets for convenience. It offers excellent uniformity in planarization, enabling repeatable results. Its advanced isothermal temperature control unit provides temperature control across the substrate up to 800°C. There is also a non-uniform gas distribution machine, which provides long process times and uniform etching rates across the substrate. NORDSON MARCH ProVIA's RF power supply is designed to remain stable even when processing heavily loaded wafers. Its advanced RF control tool offers multiple tuning parameters, such as overshoot and hysterisis, which provide excellent control over process uniformity and etch rate. The asset also has a high accuracy monitor/allow model, allowing the user to adjust the process parameters in real time. ProVIA is also designed for quick turnaround times, with a short processing cycle of only 30 seconds. It features a low-cost maintenance, with most modules and parts being easily replaced. It is efficient and ergonomically friendly, and requires a minimum operating space. Its fast processing time and multiple sample sets make it a great option for applications requiring high throughput. NORDSON MARCH ProVIA is a comprehensive and reliable dry etch solution for deep etching, planarization and patterning applications through a wide range of materials. It offers excellent uniformity, long processing times and quick turnaround times, making it an ideal choice for semiconductor and optoelectronic processing.