Used NOVELLUS Gamma 2100 #9083213 for sale

NOVELLUS Gamma 2100 is an etcher/asher equipment designed for several precision etching applications. It is suitable for applications that require high-resolution imaging, uniform etching, and tight control of etch rates. This system allows for the processing of a variety of materials, including metals, dielectrics, and compound semiconductors. Gamma 2100 utilizes a low-pressure wafer transport unit to maintain a precise and repeatable pattern on the wafer's surface. The machine is also equipped with a precise and repeatable stepper motor that controls wafer positioning and scanning, with the ability to align and deposit patterned film layers. NOVELLUS Gamma 2100 is designed to process wafers up to 300 mm in diameter and utilizes a 2x reduction imaging lens and a Faraday Cage Plate to maximize imaging performance. The tool uses a wide range of gases, and it is capable of applying multiple process steps, including masking, etching, ashing and stripping. Gamma 2100 offers precise etching control with the ability of higher selectivity, lower stress, and better depth of etch control. NOVELLUS Gamma 2100 also employs a patented upward facing quartz window asher to protect the wafer during the etching process. The asher provides uniform etching of small features as well as very large features on the wafer. It also uses a tiling process to etch the wafer in a more efficient manner. Gamma 2100 is designed to take full advantage of the excellent properties of NOVELLUS line of high-performance etching and ashing chemistries. NOVELLUS Gamma 2100 is the asset of choice for critical components in high-performance micro-electronic devices. It features reliability and consistency of processing while offering superior etching and ashing performance for top-tier thin film layer deposition. The model is also designed to bring superior uniformity to a wide variety of photolithographic processes that require a high level of automation.