Used NOVELLUS Gamma 2100 #9225554 for sale

NOVELLUS Gamma 2100 is a high-precision etcher / asher specifically designed for the deposition of thin films in semiconductor manufacturing. It is used to thin, passivate, and clean substrates to create multi-layer coatings for various electrical and optical devices. The machine utilizes a multi-head etcher / asher with superior accuracy to perform the required processing. Gamma 2100 has an open-frame design which increases visibility of the working area and allows for easy maintenance. The etcher / asher has an advanced high-energy plasma source with an average power of up to 200 W and a maximum power of 1000 W. It uses ions to chemically react with the substrate material to create thin films. The etch rate can range from 0.2 nm/second up to 6 nm/second depending on the composition of the material being etched. NOVELLUS Gamma 2100 also has a unique feature known as ion source control. This feature optimizes etch conditions to improve substrate uniformity. It allows users to adjust the intensity and focus of the ion beam in order to ensure optimal etching results. The machine also has an optional pre-clean feature which prepares the substrate by removing any existing films before the etching process begins. Gamma 2100 is quickly achieving a deserved reputation for providing reliable and repeatable thin film deposition results. It is suitable for a wide range of applications, such as the fabrication of photodiodes, capacitors, transistors, field effect transistors, and others. This machine is suitable for industrial applications as well as academic research and prototyping projects. It is an efficient and cost-effective step towards the production of high-end components.