Used NOVELLUS Gamma 2100 #9236709 for sale

NOVELLUS Gamma 2100 is an etcher/asher equipment designed and manufactured by NOVELLUS Systems Inc. This advanced etch and asher system is capable of processing a variety of substrates in the semiconductor industry, including polysilicon, metals, and insulators. It features NOVELLUS patented Substrate Temperature Control (STC) technology, allowing precise control of process temperature for precise etch and oxide removal. The unit also features an imaging capability to measure within-wafer as well as across-wafer process performance, with each layer created according to customer specifications. This etcher/asher also offers advanced nanoscale deposition capability, with its high-accuracy beam-vein tablet technology, allowing for the precision deposition of thin film layers. Gamma 2100 includes sophisticated process control and automation, allowing for a wide variety of processes and recipes to be automatically programmed. Its high-speed, high-precision scan plate moves precisely over the surface of the substrate, allowing scan lengths of up to 40 microns per step. The machine also includes a high-precision X-Y scanning stage, and a dual channels electrostatic chuck for substrates up to 150mm in diameter. By utilizing its high resolution data collection, NOVELLUS Gamma 2100 is capable of analyzing as-etched features down to 0.004 microns. It also offers a high-resolution imaging capability to measure within-wafer as well as across-wafer performance. Additionally, because of its on-board image processing capability, it is able to detect and recognize very small features in real-time without the need for any manual optimization. Gamma 2100 also offers a high degree of repeatability due to its automated calibration stage. It allows users to establish targeted values and quickly establish consistent results for each wafer. The machine also features an on-board recipe library and software, enabling users to conveniently maintain instrument settings and process recipes. In addition to its superior process performance, NOVELLUS Gamma 2100 offers low-cost operation. Its nitrogen-saving design ensures higher throughput with minimum gas consumption. This in turn decreases operational costs and increases overall efficiency. Overall, Gamma 2100 is an advanced etcher/asher tool that is capable of precisely controlling process temperature and depositing nanoscale thin film layers. It offers high-precision imaging to measure process performance, automated calibration to ensure repeatability, and low operating costs due to its nitrogen-saving design. NOVELLUS Gamma 2100 is a reliable and versatile asset that is well-suited for processing a variety of substrates in the semiconductor industry.