Used NOVELLUS Gamma 300 #132117 for sale

NOVELLUS Gamma 300 is a single-wafer electrochemical etcher/asher designed for use in the advanced photomask lithography process. It is equipped with a powerful plasma system capable of producing up to 70 Watts of RIE power and can etch Polysilicon, silicon oxide, and aluminum up to 2700 Angstroms deep. Gamma 300 uses several advanced etching techniques, including Control Grid Reactive Ion Etching (CGRIE) and Planar Etching (PE). CGRIE is a combination of double-layer etch and single or multiple masking. PE allows for the precise control of high aspect ratio vertical etching. Both techniques produce uniform high-quality patterns at a very high rate. NOVELLUS Gamma 300 also utilizes a patented process chamber that requires minimal maintenance and has a tight reproducibility of etch depth. It has a low-pressure, low-temperature operation that reduces the amount of waste produced and requires less energy than other single-wafer etchers. The system utilizes a wafer stocker, loader and unloader module, robotic manipulator, and various control modules. All of these modules are controlled by an easy-to-use touchscreen interface that allows operators to navigate through the various etching processes without any difficulty. With an excellent throughput of up to 30 wafers/hour and a fully automated etching process, Gamma 300 is a great choice for any etching and photomask lithography application.