Used NOVELLUS Gamma Express #293642130 for sale

NOVELLUS Gamma Express is an advanced etching/asher equipment designed to execute critical, high-volume and high-aspect-ratio etching and ashing applications in semiconductor and dielectric device manufacturing. This state-of-the-art etching/asher system is designed to provide high-speed and high-precision etching and ashing of a variety of substrates, primarily silicon and other semiconductor materials, with exceptional throughput, process uniformity and yield. Gamma Express is configured with a highly efficient design and incorporates technologies such as remote plasma capabilities, vertical and laterally orientated processes, linear RF and capacitance materials compatibility, radiation reduction engineering, and a fully automated substrate handling unit. These features create an optimal etching environment that reduces the risks associated with manual handling, assembly and control operations. NOVELLUS Gamma Express is powered by a nitrogen plasma source, capable of delivering high-intensity plasma, fast etching rates, and a homogeneous process. The remote plasma source ensures uniform and repeatable etch-line processes, over a wide range of materials, including: silicon, copper, germanium, titanium, aluminum, and other metals. This advanced etch-line configuration features a maximum plasma duration of up to eight minutes, and etching rates up to 6 μm/min, depending on substrate material. The fully automated substrate handling is highly reliable and efficient, providing fast and repeatable processing with reduced manual handling and parts input. Gamma Express also includes an advanced, embedded process control machine that enables users to monitor, adjust, and program the tool for optimal performance. This advanced control asset offers four etching and ashing process recipes, each featuring an adjustable 'etch rate' parameter, to accommodate a wide range of substrates and materials. Users can also customize their etch-line recipes to achieve higher throughput speeds, or to optimize their process to specific layers or features. NOVELLUS Gamma Express is designed to meet high-precision, large wafer-scale fabrication requirements. This advanced etching/asher model also delivers consistent high process uniformity, which enables high-yield, cost-effective device manufacturing. Gamma Express is designed to provide the reliability and repeatability required for today's advanced semiconductor device manufacturing requirements.