Used NOVELLUS Gamma Express #9169777 for sale
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ID: 9169777
Wafer Size: 12"
Vintage: 2004
Asher, 12"
Software OS: Window
Equipment status: In-line
Process: ETCH
Type: Non-SMIF
Automation online component: GEM
Wafer type: Notch at 6 o' clock
Software:
Y2K Completion: Yes
2004 vintage.
NOVELLUS Gamma Express is a high-precision etcher / asher designed to produce very precise product features on a wide range of substrates used in the semiconductor fabrication process. It is designed for high-throughput, high-precision micro-machining applications, and is available in multiple chamber configurations for etching and ashing. Gamma Express is a single wafer, multi-chamber etcher / asher equipment that utilizes anisotropic and dry-etch processes. It is capable of producing feature sizes down to 5 microns, and has a tool-to-wafer processing time as fast as 4 seconds. It features an advanced Cryo ECR source and two process gases, oxygen and nitrogen, to offer precise etching and ashing processes. Its Intermix chamber includes two constituents (user-configurable) that modify selectivity and thickness of the etch. Its Jet Etch Enhancer increases productivity compared to other etchers and ashers on the market. NOVELLUS Gamma Express is designed with a SENTRYX control system that offers a fully-integrated process control unit and features user-friendly control, giving its users the ability to create and manage etching and ashing recipes with its RecipeEditor. Its advanced diagnostic tools help track tool performance and provide analysis for predictive maintenance. It also features a JETON eXchange to control purge processes to reduce tool downtime. In addition, Gamma Express includes a dual-zone load lock chamber that is designed to reduce wafer handling and contamination, reducing downtime. Lastly, it has a Dual-Arm Robot to transfer wafers safely at maximum speed to reduce cost of ownership. With its advanced control machine and flexibility for processing multiple substrates, NOVELLUS Gamma Express etcher / asher is an ideal tool for any semiconductor production environment. It provides precise etching and ashing processes with improved productivity and reduced cost of ownership.
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